USPTO grants an additional patent to alpha-En corporation
Yonkers, New York April 22,2020 alpha-En announced today that it has recently been granted patent # 10,615,403 by the USPTO. The patent protects in the USA the process of depositing high purity lithium metal onto a copper substrate.
CEO and Chairman Sam Pitroda comments: “We are proud to announce that we were able to add a very important patent to our growing IP portfolio. This is consistent with our IP strategy that we execute against with our patent attorneys at K&L Gates. For an emerging technology company the quality of the IP protection is at the core of the overall corporate strategy as it protects its most important asset. It is our stated goal to continue to expand our patent portfolio scientifically as well as geographically in order to protect our significant capital investments and to create value for our shareholders, We would like to thank the members of our science team for their continued dedication to their tasks in a very difficult environment and express gratitude to our shareholders for their patience and continued support through times of unprecedented challenges.”